Film Continuous Deposition Device
Film Continuous Deposition Device
Device for continuously forming films from roll-shaped film ■□■Features■□■ ■Compatible with sputtering, EB, and resistance heating deposition ■Tension pickup feedback control ■Cold trap for film release gas exhaust ■Differential exhaust system (optional installation) ■Substrate cleaning mechanism ■Resistance value transmittance monitoring mechanism ■Deposition roller cooling refrigerant system ■Supports continuous film formation on both sides (see image on the right) ■Roll width, roll diameter, and winding speed are negotiable ■Winding control with independent control of UW, W, and CR ■For custom-made semiconductor manufacturing equipment, scientific instruments, and accessories, please leave it to us. For details, please contact us.
- Company：ケニックス
- Price：Other
